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说明
Function: Exposure machine Structure: Modular CD 0.11配置
无配置OEM 型号描述
This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.文件
无文件
类别
Steppers & Scanners
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
123817
晶圆尺寸：
未知
年份：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/1100B
类别
Steppers & Scanners
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
123817
晶圆尺寸：
未知
年份：
2001
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Function: Exposure machine Structure: Modular CD 0.11配置
无配置OEM 型号描述
This ASML step and scan tool supports 8" / 200m process nodes. The ASML 5500/1100B lithography system uses ASML's patented Athena wafer alignment system. The stepper is equipped with a 193 nm ArF laser and 0.75 NA and is capable of sub 100nm resolution. Applications for the ASML 5500/1100B include the fabrication of photonic ICs.文件
无文件