说明
无说明配置
DUV Stepper - Lens Unit, Cables and Panels onlyOEM 型号描述
The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.文件
无文件
ASML
PAS 5500/300C
已验证
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17645
晶圆尺寸：
8"/200mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/300C
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17645
晶圆尺寸：
8"/200mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
DUV Stepper - Lens Unit, Cables and Panels onlyOEM 型号描述
The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.文件
无文件