说明
I-Line Stepper配置
280nm, I-Line StepperOEM 型号描述
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.文件
无文件
ASML
PAS 5500/400
已验证
类别
Steppers & Scanners
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
90944
晶圆尺寸：
8"/200mm
年份：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/400
类别
Steppers & Scanners
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
90944
晶圆尺寸：
8"/200mm
年份：
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
I-Line Stepper配置
280nm, I-Line StepperOEM 型号描述
The PAS 5500/400 is specified at 0.30um Current i-Line resists are capable to resolve structures down to 0.30 and 0.28um imaging. The maximum MA of the PAS 5500/400 is 0.65. Together with the AERIAL Illuminator the /400 will provide enough process latitude for mass production at 0.30um, extendable down to 0.28 and 0.25um. The highest resolution of the /400 maximized the number of i-Line layers in a full device layer stack.文件
无文件