说明
无说明配置
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM 型号描述
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.文件
无文件
类别
Steppers & Scanners
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
138151
晶圆尺寸：
12"/300mm
年份：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1060K
类别
Steppers & Scanners
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
138151
晶圆尺寸：
12"/300mm
年份：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Asset Description: ASML KrF Twinscan Software Version: 5.1 CIM: SECS/GEM Process: 12LP Main System: Main Tool Body (1) Handler System: TEL TRK interface (1) Factory Interface: FOUP (2)OEM 型号描述
The TWINSCAN XT:1060K is ASML’s most advanced KrF (krypton fluoride) laser ‘dry’ lithography system. The TWINSCAN XT:1060K 248 nm step-and-scan system is a dual-stage lithography tool with the highest NA and productivity in the industry, designed for 300 mm wafer production. Extending critical KrF technology reduces our customers' cost per layer while allowing them to benefit from mature KrF processing.文件
无文件