概述

The TWINSCAN XT:1400F is a dual-stage ArF lithography tool optimized for 200-mm and 300-mm wafer production at 65-nm resolution. Leveraging a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, it pushes ArF technology beyond the 65-nm node. Its dual wafer-stage permits simultaneous exposure and alignment, maximizing productivity. The system ensures superior focus across the full wafer and boasts a throughput of 133 300-mm wph and 165 200-mm wph. Equipped for extreme low-k1 operation, it offers an enhanced process window, consistent CD uniformity, and onboard metrology for process tracking.