说明
193NM ARF SCANNER配置
无配置OEM 型号描述
The TWINSCAN XT:1400F is a dual-stage ArF lithography tool optimized for 200-mm and 300-mm wafer production at 65-nm resolution. Leveraging a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, it pushes ArF technology beyond the 65-nm node. Its dual wafer-stage permits simultaneous exposure and alignment, maximizing productivity. The system ensures superior focus across the full wafer and boasts a throughput of 133 300-mm wph and 165 200-mm wph. Equipped for extreme low-k1 operation, it offers an enhanced process window, consistent CD uniformity, and onboard metrology for process tracking.文件
无文件
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
128073
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
TWINSCAN XT:1400
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
128073
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
193NM ARF SCANNER配置
无配置OEM 型号描述
The TWINSCAN XT:1400F is a dual-stage ArF lithography tool optimized for 200-mm and 300-mm wafer production at 65-nm resolution. Leveraging a 0.65-0.93 NA Carl Zeiss lens and AERIAL E Illuminator, it pushes ArF technology beyond the 65-nm node. Its dual wafer-stage permits simultaneous exposure and alignment, maximizing productivity. The system ensures superior focus across the full wafer and boasts a throughput of 133 300-mm wph and 165 200-mm wph. Equipped for extreme low-k1 operation, it offers an enhanced process window, consistent CD uniformity, and onboard metrology for process tracking.文件
无文件