说明

Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.

配置

0.35 0.45~0.63 5:1 22*26 70

OEM 型号描述

The Canon FPA-3000 i4 is a stepper used in the semiconductor industry. It has a reticle size of 6" square with a thickness of 0.25" and is made of quartz material1. It can handle wafer sizes of 4" through 8" that are SEMI Standard, JEIDA, Notch/Flat. The Canon FPA-3000 i4 has a projection magnification of 1/5 X and a numerical aperture of .45 - .63. The field size is 22x22 17x26 and the exposure light is Kr F (365nm). The estimated throughput of the Canon FPA-3000 i4 is 59 wafers per hour for an 8" wafer with 60 shots and 22 mm field size. For a 6" wafer, it can handle up to 83 wafers per hour with 32 shots and 22 mm field size. The Canon FPA-3000 i4 has an alignment accuracy of less than 0.06 μm (mean + 3 σ). The Canon FPA-3000 i4 has a resolution of 0.35 μm.

文件

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CANON

FPA-3000i4

已验证

类别

Steppers & Scanners

上次验证： 30 多天前

物品主要详细信息

状况：

Used

运行状况:

未知

产品编号：

131679

晶圆尺寸：

4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm

年份：

未知

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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