概述

"This step-and-scan system comes with a single stage lithography tool and 0.86 NA. It comes with NA KrF lens with 90nm. The Canon FPA-6000 ES6 can be configured for 200mm or 300mm wafers. Throughput for 300mm is ≥100wph (300mm,122shots) and for 200mm is ≥ 170wph."