概述

Resolution: ≦ 500 nm NA (Numerical Aperture): 0.37~0.28 (Variable) Reduction Ratio1:2 Field Size: 52 mm (max) x 56 mm (max) (Φ70.7 mm inside) Exposure Wavelength: i-line 365 nm Reticle Size: 6 inch Wafer Size: 200 mm (8 inch), 300 mm (12 inch) (Selection)