说明
5x Reduction Stepper配置
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM 型号描述
未提供文件
无文件
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
131961
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
GCA
AutoStep 200
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
131961
晶圆尺寸：
8"/200mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
5x Reduction Stepper配置
* The GCA AutoStep 200 Stepper is an I-line 5x reduction stepper with repeat exposure capabilities. It is capable of submicron resolution and high accuracy alignment. * 21 mm dia exposure field (up to 14.8 X 14.8 mm square) * Can achieve resolution < 600 nm * 200 mm wafer stage * Stage precision < 100 nm * Accommodates wafer sizes from 1 cm pieces to 6” wafers * Automatic reticle transfer alignment through RMS (reticle management system) * Exposure wavelength of 365 nmOEM 型号描述
未提供文件
无文件