说明
无说明配置
Resolution: 0.35µm Reduction ratio: 1:5 Exposure field: 22mm Alignment accuracy: ≦ 70 nm Wafer size: Currently 8 inch notch- can be converted to any sizeOEM 型号描述
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.文件
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NIKON
NSR-2205i11D
已验证
类别
Steppers & Scanners
上次验证： 8 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
115159
晶圆尺寸：
8"/200mm
年份：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-2205i11D
类别
Steppers & Scanners
上次验证： 8 天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
115159
晶圆尺寸：
8"/200mm
年份：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Resolution: 0.35µm Reduction ratio: 1:5 Exposure field: 22mm Alignment accuracy: ≦ 70 nm Wafer size: Currently 8 inch notch- can be converted to any sizeOEM 型号描述
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.文件
无文件