说明
European CE Safety mark certification配置
i-Line Stepper Performance Specification: 1. Resolution: 0.35μm or less High resolution, positive resist film of 1.0μm thickness 2. Focus Calibration Repeatability: Within 100nm (3σ) 20 measurements 3. Lens Distortion (including magnification error): Within ± 40nm 37 points / chip 4. Magnification Control: Within ± 15nm 3 measurements of Initial, Heat (180min.) and Cool (240min.) 5. Maximum Exposure Area: Within 31.11mm dia. 22.0mm x 22.0mm to 17.96mm x 25.2mm (hor.) X (vert.) 6. Reticle Blind Setting Accuracy: + 0.4 to + 0.8mm (on reticle) 7. Exposure Power: 800 mW/cm2 or more Measured after a new lamp is installed 8. Integrated Exposure Stability (including integrated exposure matching): Within ± 1.0% (50 mJ/cm2 or more) Within ± 0.5% (at 100mJ/cm2) 9. Illumination Uniformity Within ± 1.0% Inside exposure area 5 measurementsOEM 型号描述
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.文件
无文件
类别
Steppers & Scanners
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148409
晶圆尺寸：
6"/150mm
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部
NIKON
NSR-2205i12D
类别
Steppers & Scanners
上次验证： 4 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
148409
晶圆尺寸：
6"/150mm
年份：
2006
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
European CE Safety mark certification配置
i-Line Stepper Performance Specification: 1. Resolution: 0.35μm or less High resolution, positive resist film of 1.0μm thickness 2. Focus Calibration Repeatability: Within 100nm (3σ) 20 measurements 3. Lens Distortion (including magnification error): Within ± 40nm 37 points / chip 4. Magnification Control: Within ± 15nm 3 measurements of Initial, Heat (180min.) and Cool (240min.) 5. Maximum Exposure Area: Within 31.11mm dia. 22.0mm x 22.0mm to 17.96mm x 25.2mm (hor.) X (vert.) 6. Reticle Blind Setting Accuracy: + 0.4 to + 0.8mm (on reticle) 7. Exposure Power: 800 mW/cm2 or more Measured after a new lamp is installed 8. Integrated Exposure Stability (including integrated exposure matching): Within ± 1.0% (50 mJ/cm2 or more) Within ± 0.5% (at 100mJ/cm2) 9. Illumination Uniformity Within ± 1.0% Inside exposure area 5 measurementsOEM 型号描述
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.文件
无文件