说明
无说明配置
Lamp intensity: 820.766 Uniformity: 2.55 Lens tilt: 0.196 LSA & FIA: X: 0.056 Y: 0.046 Reticle rotation: 1 Lens distortion: X: 0.014-0.038 Y: 0.030-0.045 Stepping: 0.018OEM 型号描述
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.文件
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NIKON
NSR-2205i12D
已验证
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
29845
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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NIKON
NSR-2205i12D
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
29845
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Lamp intensity: 820.766 Uniformity: 2.55 Lens tilt: 0.196 LSA & FIA: X: 0.056 Y: 0.046 Reticle rotation: 1 Lens distortion: X: 0.014-0.038 Y: 0.030-0.045 Stepping: 0.018OEM 型号描述
"This i-line stepper from Nikon is one of our most popular lithography systems. Resolution ≦ 350 nm, exposure light source i-line (365 nm wavelength), reduction ratio 1:5, exposure field 22mm square to 17.9 (H) × 25.2 (V) mm (6-inch reticle), 20.0 × 20.4 mm (5-inch reticle), alignment accuracy (EGA, |M| + 3σ) ≦ 55 nm. The NIKON NSR 2205 i12D is a Steppers and Scanners system. The NSR 2205 i12D can be used with 8” wafer sizes.文件
无文件