说明
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.配置
0.11 0.82 4:1 26*33 20 20OEM 型号描述
Step-and-Repeat Scanning System NSR-S207D, a lens-scanning KrF excimer stepper for mass production of 110nm advanced devices incorporating an ultra-high N.A. lens. The NSR-S207D incorporates an ultra-high N.A. (N.A.O.82) projection lens, for the KrF excimer laser (248nm wavelength), and uses a newly developed body to significantly improve throughput performance and alignment accuracy.文件
无文件
NIKON
NSR-S207D
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
131675
晶圆尺寸：
4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Nikon KrF lithography machines use 248nm wavelength KrF excimer lasers as exposure light sources, which are suitable for more sophisticated semiconductor processes and are widely used in the manufacture of high-performance semiconductor devices, including microprocessors, dynamic random access memory (DRAM), and complex logic and mixed signal chips. These lithography machines are key equipment for achieving high-precision semiconductor device manufacturing, and play an important role in 4-inch, 6-inch, 8-inch and 12-inch wafer production lines, providing semiconductor manufacturers with flexibility and efficient production capabilities.配置
0.11 0.82 4:1 26*33 20 20OEM 型号描述
Step-and-Repeat Scanning System NSR-S207D, a lens-scanning KrF excimer stepper for mass production of 110nm advanced devices incorporating an ultra-high N.A. lens. The NSR-S207D incorporates an ultra-high N.A. (N.A.O.82) projection lens, for the KrF excimer laser (248nm wavelength), and uses a newly developed body to significantly improve throughput performance and alignment accuracy.文件
无文件