说明
Nikon Arf lithography machine uses 193nm wavelength ArF excimer laser for exposure, which is suitable for advanced semiconductor manufacturing processes. It can support the current mainstream 12-inch wafer production, and is also suitable for the production of 8-inch wafers. It can achieve smaller feature sizes and plays a vital role in improving chip performance and integration. It provides semiconductor manufacturers with high-precision and high-production efficiency solutions.配置
Scanning 0.07 0.92 4:1 26*33 12OEM 型号描述
NSR-S308F (resolution ≦ 65 nm). The NSR-308F has a newly developed platform that enables dramatic improvements in alignment accuracy and throughput. Alignment accuracy has been reduced to 8 nm or less, a 44% improvement over Nikon’s previous generation ArF scanner, while throughput was increased to 140 wafers or more per hour for 300 mm wafers, an improvement of approximately 25%. With this significant increase in productivity, the system delivers next-generation process capabilities at a lower overall cost of ownership.文件
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NIKON
NSR-S308F
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
131677
晶圆尺寸：
8"/200mm, 12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Nikon Arf lithography machine uses 193nm wavelength ArF excimer laser for exposure, which is suitable for advanced semiconductor manufacturing processes. It can support the current mainstream 12-inch wafer production, and is also suitable for the production of 8-inch wafers. It can achieve smaller feature sizes and plays a vital role in improving chip performance and integration. It provides semiconductor manufacturers with high-precision and high-production efficiency solutions.配置
Scanning 0.07 0.92 4:1 26*33 12OEM 型号描述
NSR-S308F (resolution ≦ 65 nm). The NSR-308F has a newly developed platform that enables dramatic improvements in alignment accuracy and throughput. Alignment accuracy has been reduced to 8 nm or less, a 44% improvement over Nikon’s previous generation ArF scanner, while throughput was increased to 140 wafers or more per hour for 300 mm wafers, an improvement of approximately 25%. With this significant increase in productivity, the system delivers next-generation process capabilities at a lower overall cost of ownership.文件
无文件