说明
无说明配置
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEM 型号描述
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.文件
无文件
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NIKON
NSR-SF100
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
112206
晶圆尺寸：
8"/200mm
年份：
2003
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEM 型号描述
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.文件
无文件