说明
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.配置
0.28 0.62 4:1 26*33 FIA:45OEM 型号描述
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.文件
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NIKON
NSR-SF130
类别
Steppers & Scanners
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
131670
晶圆尺寸：
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.配置
0.28 0.62 4:1 26*33 FIA:45OEM 型号描述
NSR-SF130, a scan-field i-line stepper with high throughput and extremely low cost of ownership. The system makes use of leading-edge lens technology to achieve the same wide exposure field (26×33 mm) as DUV scanners, making it ideal for mix and match applications. The NSR-SF130, Nikon’s fifth new semiconductor systems announced in 2003, achieves a resolution of 280 nm or better and boasts a throughput of 120 wafers/hour for 300 mm wafers. The system combines superior performance with the lowest cost of ownership to help reduce semiconductor manufacturing costs.文件
无文件