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VEECO / ULTRATECH SATURN SPECTRUM 3
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Ultratech Saturn Spectrum 3 is a stepper and scanner system utilized in the production of semiconductor devices. It is capable of manufacturing wafers in sizes ranging from 4 to 8 inches. Ultratech also offers an updated version of this system, the Saturn Spectrum 3e, which incorporates an enhanced machine vision system (MVS) that includes the PatMAX architecture. The Saturn Spectrum 3e also boasts improved illumination, with a wafer plane irradiance of 1900 mW/cm2, resulting in shorter exposure times.
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    PREFERRED
     
    SELLER
    类别
    Steppers & Scanners

    上次验证: 60 多天前

    Buyer pays 12% premium of final sale price
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    112087


    晶圆尺寸:

    6"/150mm, 8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    PREFERRED
     
    SELLER

    VEECO / ULTRATECH

    SATURN SPECTRUM 3

    verified-listing-icon
    已验证
    类别
    Steppers & Scanners
    上次验证: 60 多天前
    listing-photo-2bbdce14c26241af84bcd56f6a6bc152-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Buyer pays 12% premium of final sale price
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    112087


    晶圆尺寸:

    6"/150mm, 8"/200mm


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    无配置
    OEM 型号描述
    The Ultratech Saturn Spectrum 3 is a stepper and scanner system utilized in the production of semiconductor devices. It is capable of manufacturing wafers in sizes ranging from 4 to 8 inches. Ultratech also offers an updated version of this system, the Saturn Spectrum 3e, which incorporates an enhanced machine vision system (MVS) that includes the PatMAX architecture. The Saturn Spectrum 3e also boasts improved illumination, with a wafer plane irradiance of 1900 mW/cm2, resulting in shorter exposure times.
    文件

    无文件