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VEECO / ULTRATECH TITAN II
  • VEECO / ULTRATECH TITAN II
  • VEECO / ULTRATECH TITAN II
  • VEECO / ULTRATECH TITAN II
说明
无说明
配置
无配置
OEM 型号描述
The Ultratech TITAN II is a type of wafer stepper that belongs to the Ultratech series of lithography systems. It is capable of handling wafers that range in size from 4 inches to 8 inches, and it has a reticle size of 5 x 5 inches. The system has a projection ratio of 1:1, a lens resolution of 2 micrometers, and a field size of 44 millimeters by 22 millimeters. Additionally, the TITAN II includes a reticle library that has 12 slots and a bar code reader. It also has a stage with a monolithic structure and linear motor drive. The system is equipped with active air isolation to control vibrations and has global alignment accuracy of 120 nanometers in just 3 seconds. The imaging and lens system can achieve feature sizes as small as 2.0 micrometers, with lens distortion of 120 nanometers and colinearity of 80 nanometers. The maximum image area is 55 millimeters by 18 millimeters, and the exposure spectrum is broadband, ranging from 390 nanometers to 450 nanometers. The wafer plane intensity is greater than 1200 milliwatts per square centimeter, with uniformity of 2.0%.
文件

无文件

类别
Steppers & Scanners

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

72673


晶圆尺寸:

6"/150mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

VEECO / ULTRATECH

TITAN II

verified-listing-icon
已验证
类别
Steppers & Scanners
上次验证: 60 多天前
listing-photo-20222586e3294306b9ca57b06d2a95ef-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

72673


晶圆尺寸:

6"/150mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明
配置
无配置
OEM 型号描述
The Ultratech TITAN II is a type of wafer stepper that belongs to the Ultratech series of lithography systems. It is capable of handling wafers that range in size from 4 inches to 8 inches, and it has a reticle size of 5 x 5 inches. The system has a projection ratio of 1:1, a lens resolution of 2 micrometers, and a field size of 44 millimeters by 22 millimeters. Additionally, the TITAN II includes a reticle library that has 12 slots and a bar code reader. It also has a stage with a monolithic structure and linear motor drive. The system is equipped with active air isolation to control vibrations and has global alignment accuracy of 120 nanometers in just 3 seconds. The imaging and lens system can achieve feature sizes as small as 2.0 micrometers, with lens distortion of 120 nanometers and colinearity of 80 nanometers. The maximum image area is 55 millimeters by 18 millimeters, and the exposure spectrum is broadband, ranging from 390 nanometers to 450 nanometers. The wafer plane intensity is greater than 1200 milliwatts per square centimeter, with uniformity of 2.0%.
文件

无文件