- Model: Mark 40C  
- Process Chamber Dimensions: 26” x  26”  
- CHA SR-10 E-Beam Power Supply  (10kW)  
- CHA T271-4-1 Electron Beam Source  
- Crucible: 4 pockets, 15cc each  
- CHA Beam Sweep Controller  
- CHA Auto Tech-2 Pump Cycle Controller  
- Blade Position Controller  
- Fixture Control and Shutter Controller  
- E.B. Gun Rotation Controller  
- RGA Valve Control  
- Substrate Heat  
- 10kW Heater Power Supply (CHA HPS-671-10)  
- Sycon STC-200/SQ Deposition Rate Controller  
- Granville Philips 307 Vacuum Gauge Control  
- MKS Type 250 Pressure/Flow Controller  
- Neslab CFT-150 Chillers, Qty 2  
- CTI-Cryogenics 8500 Compressor  
- Edwards E2M40 2-Stage Vacuum Pump  
- Liquid Nitrogen Level Control

The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.

MARK 40

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MARK 40

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