跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
CHA MARK 50
  • CHA MARK 50
  • CHA MARK 50
  • CHA MARK 50
说明
Liftoff process
配置
无配置
OEM 型号描述
The CHA Mark 50 is an industry-standard high vacuum deposition system known for its simplicity, ease of operation, and unmatched reliability, making it an excellent choice for a wide range of applications. The system features a horizontal 32" by 32" water-cooled cylindrical chamber, facilitating easy loading and unloading. Its unique slide-down front door minimizes floor space requirements, and a rear door provides convenient access to the chamber from behind, allowing for through-the-wall mounting. The Mark 50 is SECS/GEM and CE compliant, ensuring compatibility with modern manufacturing standards. It offers dual operation capabilities for sputtering and evaporation, accommodates moving substrates, and provides exceptional film uniformity (fixture dependent). The system supports up to 4 process stations with round cathodes (RF or DC) and co-deposition capability. Additionally, it includes bias (RF or DC), substrate heating up to 400°C with multi-element options, electron beam, thermal deposition, ion beam pre-clean/etch, and plasma texturing/etch functionalities. -Dual Operation, Sputtering and Evaporation -Moving substrates -Exceptional Film Uniformity (Fixture Dependent) -Sputter Up -Process Stations -Round Cathodes, RF or DC (Up to 4 Stations) -Co-deposit -Bias, RF or DC -Substrate heating, 400°C, multi-element -Substrate heating, station -Electron beam -Thermal -Ion beam pre-clean/etch -Plasma texturing/etch
文件

无文件

verified-listing-icon

已验证

类别
Thermal Evaporators

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

41191


晶圆尺寸:

6"/150mm


年份:

2000


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

CHA

MARK 50

verified-listing-icon
已验证
类别
Thermal Evaporators
上次验证: 60 多天前
listing-photo-68beda5f9afe4208b1e1ab3a9c803fb8-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

41191


晶圆尺寸:

6"/150mm


年份:

2000


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Liftoff process
配置
无配置
OEM 型号描述
The CHA Mark 50 is an industry-standard high vacuum deposition system known for its simplicity, ease of operation, and unmatched reliability, making it an excellent choice for a wide range of applications. The system features a horizontal 32" by 32" water-cooled cylindrical chamber, facilitating easy loading and unloading. Its unique slide-down front door minimizes floor space requirements, and a rear door provides convenient access to the chamber from behind, allowing for through-the-wall mounting. The Mark 50 is SECS/GEM and CE compliant, ensuring compatibility with modern manufacturing standards. It offers dual operation capabilities for sputtering and evaporation, accommodates moving substrates, and provides exceptional film uniformity (fixture dependent). The system supports up to 4 process stations with round cathodes (RF or DC) and co-deposition capability. Additionally, it includes bias (RF or DC), substrate heating up to 400°C with multi-element options, electron beam, thermal deposition, ion beam pre-clean/etch, and plasma texturing/etch functionalities. -Dual Operation, Sputtering and Evaporation -Moving substrates -Exceptional Film Uniformity (Fixture Dependent) -Sputter Up -Process Stations -Round Cathodes, RF or DC (Up to 4 Stations) -Co-deposit -Bias, RF or DC -Substrate heating, 400°C, multi-element -Substrate heating, station -Electron beam -Thermal -Ion beam pre-clean/etch -Plasma texturing/etch
文件

无文件