ULVAC

EBX 1000

EBX-16C

EBX 1000C

EI-OPT

Mini-Lab

Batch Type System
Various evaporation sources can be loaded. (EB,
RH, EB + RH)

Substrate size: φ2 to 6 inch Supports rectangular,
Si, compounds, glass and ceramics substrates

EI-7L

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

EI-5K

EBX-10C

EX-400

CV-200

Batch type high vacuum evaporation equipment ei series is equipment that can form metal film or oxide film on the substrate. It can be controlled centrally through the operation panel to realize centralized automatic operation of vacuuming, film forming and other operations, which is suitable for research and development and small-scale production

EI-501z

YH 500AS

Loaded number / Revolution dome: 44 pc…Φ4 in / 20 pc…Φ6 in
SS distance: 900mm
Substrate holder: Revolution, Planetary or Satellite can be selected
Incident angle (Lift-off): 3.3°…Φ 4 in 4.9°…Φ 6 in

ei-7

EX 650-C16

EBH 6

Batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate.

Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).

EI-5Z

EI-7K

EX 550

EX 650

EX-550-T10

EBX 2000

EBV-6DA

EBB-16C

EX-550-D10-B

EX-400-C08

The EI-5 is a Batch or Loard Lock Type High Vacuum Evaporation System. It has a substrate size: φ2 to 6 inch Supports rectangular,Si, compounds, glass and ceramics substrates"

ei-5

EBX  6D

MBE-BC2400

batch type high vacuum evaporation system for the deposition of metal and oxide on a substrate. 


Supports various evaporation sources (i.e. EB, RH, EB + RH etc.).
Substrate holders complying with each process (i.e. lift-off, planetary, satellite etc.).
Supports various substrates; substrates size from φ2in to 6in, rectangular substrates, Si, compounds, glass and ceramics.
Display and operation on LCD touch panel.
Superior PC-operating system and functions (recipe function, data logging, maintenance assist function).



EI-5T

EBS 10A

EX 550-C10

EBX 8C

Satella is an advanced system designed for organic deposition processes, featuring a multiple independent chamber configuration that enables efficient full-color device production, a task challenging for its counterpart Solciet. It boasts a unique 7-sided transfer chamber and accommodates 2 to 4 organic deposition chambers, adjustable as required. Additionally, Satella is equipped with a high-precision mask alignment mechanism, specifically tailored for active-matrix full-color devices. It standardly supports substrates up to 200 mm in diameter, optimizing its usability in specialized manufacturing contexts.

SATELLA

EBX 10D

EBX 2000C

EBV-6CH

ULVAC

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热门 ULVAC Thermal Evaporators

EI-OPT

EBX-16C

EBX 1000C

EBX 1000

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