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说明
无说明配置
无配置OEM 型号描述
The Nanometrics Atlas™ is an advanced metrology system that can accommodate both 200 or 300 mm wafer metrology. It features a dual-arm robot, high-precision stage, and high-speed focus system. The system also boasts robust pattern recognition, improved thickness reproducibility, and superior throughput. The N2000 software interface and advanced automation are compliant with industry standards, and the NanoNet feature provides system-to-system matching and seamless recipe transferability. The Atlas can be configured with a combination of metrology modules, including Spectroscopic Reflectometer (SR), Spectroscopic Ellipsometer (SE), Optical Critical Dimension (OCD), Diffraction Based Overlay (DBO), and Wafer Stress/Bow.文件
无文件
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
38056
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / NANOMETRICS / ACCENT / BIO-RAD
ATLAS
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
38056
晶圆尺寸：
12"/300mm
年份：
未知
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
The Nanometrics Atlas™ is an advanced metrology system that can accommodate both 200 or 300 mm wafer metrology. It features a dual-arm robot, high-precision stage, and high-speed focus system. The system also boasts robust pattern recognition, improved thickness reproducibility, and superior throughput. The N2000 software interface and advanced automation are compliant with industry standards, and the NanoNet feature provides system-to-system matching and seamless recipe transferability. The Atlas can be configured with a combination of metrology modules, including Spectroscopic Reflectometer (SR), Spectroscopic Ellipsometer (SE), Optical Critical Dimension (OCD), Diffraction Based Overlay (DBO), and Wafer Stress/Bow.文件
无文件