说明
Nanometrics Nanospec 2100 Film Thickness Measure配置
*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.OEM 型号描述
75 mm to 200 mm substrates Variety of measurement modes Manual stage.文件
无文件
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 2100
已验证
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
66021
晶圆尺寸：
8"/200mm
年份：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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Thin Film / Film Thickness年份： 2000状况： 二手
上次验证60 多天前
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 2100
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
66021
晶圆尺寸：
8"/200mm
年份：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Nanometrics Nanospec 2100 Film Thickness Measure配置
*. Process: Film thickness measurement. - silicon dioxide on silicon 400~ 30,000 A. - photo resist on silicon 500~ 40,000 A. - other thin films. *. Hardware configuration: - Optical microscope & objectives 5x,10x,40x. - Spectrophotometer Head. - Microcomputer & Monitor. - Photo intensity Display & Wavelength counter. - Microscope Stage. *. Wavelength : 390~800 nm TungstenLamp 12V /50W.OEM 型号描述
75 mm to 200 mm substrates Variety of measurement modes Manual stage.文件
无文件