说明
Nanometrics Nanospec 4150 Film Thickness Measure配置
Automatic Stage & Stage controller with twin chuck (4 ~ 8" wafer size) UV lamp housing & Deuterium Lamp Power Supply Auto focus : Not available (Image capture board to be repaired) Wavelength : Visible 400~900nm , 200~900nm with UV (option) Accuracy : Within ± 1% (Oxide Standard) Precision : 2Å, 500~50,000Å Visible /1Å, 25~500Å UV option Stability : 0.5% or 5Å or whichever is greater Data analysis : Mapping contour 2D and 3D / Statistical Process Control (SPC)OEM 型号描述
The Model 4150, an enhanced version of the Model 4100 introduced in the middle of 1994, provides automated stage and focusing systems for hands-off uniformity maps.文件
无文件
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 4150
已验证
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17226
晶圆尺寸：
8"/200mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 4150
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
17226
晶圆尺寸：
8"/200mm
年份：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Nanometrics Nanospec 4150 Film Thickness Measure配置
Automatic Stage & Stage controller with twin chuck (4 ~ 8" wafer size) UV lamp housing & Deuterium Lamp Power Supply Auto focus : Not available (Image capture board to be repaired) Wavelength : Visible 400~900nm , 200~900nm with UV (option) Accuracy : Within ± 1% (Oxide Standard) Precision : 2Å, 500~50,000Å Visible /1Å, 25~500Å UV option Stability : 0.5% or 5Å or whichever is greater Data analysis : Mapping contour 2D and 3D / Statistical Process Control (SPC)OEM 型号描述
The Model 4150, an enhanced version of the Model 4100 introduced in the middle of 1994, provides automated stage and focusing systems for hands-off uniformity maps.文件
无文件