说明
Software Version - Summit 4.9 CIM - SECs/GEM Process - Thickness Film Measurement配置
Factory Interface - FOUP - Quantity 2 Handler System - KLA Phoenix 2OEM 型号描述
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.文件
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KLA
ASET-F5x
类别
Thin Film / Film Thickness
上次验证： 11 天前
物品主要详细信息
状况：
Used
运行状况:
Installed / Running
产品编号：
150566
晶圆尺寸：
12"/300mm
年份：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Software Version - Summit 4.9 CIM - SECs/GEM Process - Thickness Film Measurement配置
Factory Interface - FOUP - Quantity 2 Handler System - KLA Phoenix 2OEM 型号描述
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.文件
无文件