说明
N&K 8000 CD Trench Depth & Thin film Measurement Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers配置
Working DUV - Vis - NIR: 190nm to 1000nm Reflectance, Polarized Analyzer Unit with spot size : 50 um Cognex Pattern Recognition Software Windows 7 Operating System S/W Version : 10.5.3.0 n&k's Thin Film Characterization S/W n&k's Standard Films Library Automated Wafer Loading/Unloading Assyst Loadport for 8" Wafers Computerized X-Y stage for full wafer mapping, and wafer alignment capability Z-stage to accommodate multiple substrate thickness SEMI and CE Certification Application : Simultaneously determines thickness, n and k of thin films including semiconductors ,dielectronic (SiO2, Si3N4),etc, Polymers (Photoresist, etc),and very thin metals - Thin Film : Film Thickness / n and k - OCD : Depth / CD / ProfileOEM 型号描述
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N & K
8000-CD
已验证
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
21701
晶圆尺寸：
8"/200mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
N & K
8000-CD
类别
Thin Film / Film Thickness
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
21701
晶圆尺寸：
8"/200mm
年份：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
N&K 8000 CD Trench Depth & Thin film Measurement Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers配置
Working DUV - Vis - NIR: 190nm to 1000nm Reflectance, Polarized Analyzer Unit with spot size : 50 um Cognex Pattern Recognition Software Windows 7 Operating System S/W Version : 10.5.3.0 n&k's Thin Film Characterization S/W n&k's Standard Films Library Automated Wafer Loading/Unloading Assyst Loadport for 8" Wafers Computerized X-Y stage for full wafer mapping, and wafer alignment capability Z-stage to accommodate multiple substrate thickness SEMI and CE Certification Application : Simultaneously determines thickness, n and k of thin films including semiconductors ,dielectronic (SiO2, Si3N4),etc, Polymers (Photoresist, etc),and very thin metals - Thin Film : Film Thickness / n and k - OCD : Depth / CD / ProfileOEM 型号描述
未提供文件
无文件