跳至主要内容
We value your privacy

We and our selected partners use cookies to enhance your browsing experience, serve personalized content, and analyze our traffic. By clicking "Accept All", you consent to our use of cookies. 阅读更多

Moov logo

Moov Icon
LAM RESEARCH / NOVELLUS SOLA
  • LAM RESEARCH / NOVELLUS SOLA
  • LAM RESEARCH / NOVELLUS SOLA
  • LAM RESEARCH / NOVELLUS SOLA
说明
UVC51x_UVCure Dual Wavelength
配置
无配置
OEM 型号描述
SOLA is an innovative ultraviolet thermal processing (UVTP) system used for the low-temperature, post-deposition treatment of dielectric films. SOLA is designed for advanced materials such as high stress nitrides and porous low-k dielectrics that are used to deliver increased device speeds and lower power consumption in sub-90 nanometer chips. SOLA employs a high-productivity multi-station sequential treatment (MSST) architecture that achieves a treatment non-uniformity of less than 2%, thereby improving device yields.
文件

无文件

类别
UV-Curing

上次验证: 30 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

128163


晶圆尺寸:

12"/300mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

LAM RESEARCH / NOVELLUS

SOLA

verified-listing-icon
已验证
类别
UV-Curing
上次验证: 30 多天前
listing-photo-2f489b643d9943aebd4610c5cd5109b5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

128163


晶圆尺寸:

12"/300mm


年份:

未知


Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
UVC51x_UVCure Dual Wavelength
配置
无配置
OEM 型号描述
SOLA is an innovative ultraviolet thermal processing (UVTP) system used for the low-temperature, post-deposition treatment of dielectric films. SOLA is designed for advanced materials such as high stress nitrides and porous low-k dielectrics that are used to deliver increased device speeds and lower power consumption in sub-90 nanometer chips. SOLA employs a high-productivity multi-station sequential treatment (MSST) architecture that achieves a treatment non-uniformity of less than 2%, thereby improving device yields.
文件

无文件