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memsstar Orbis 3000
    说明
    Purpose: Vapor MEMS Release -Use for silicon sacrificial layer removal (Etching) -Single wafer process in vacuum chamber -Process Temperature can be 5oC to >100oC
    配置
    Chemicals: HF Process type: Single wafer Pumping system: -Ebara AA200WN*2 -Ebara AA40WN*2 (1 for service and 1 for spare) Local Scrubber: Kanken Techno KW300
    OEM 型号描述
    未提供
    文件

    无文件

    memsstar

    Orbis 3000

    verified-listing-icon

    已验证

    类别
    Wafer Handling

    上次验证： 2 天前

    物品主要详细信息
    状况：

    New

    运行状况:

    未知

    产品编号：

    147939

    晶圆尺寸：

    未知

    年份：

    2021

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    memsstar Orbis 3000

    memsstar

    Orbis 3000

    Wafer Handling
    年份： 2021状况： 全新
    上次验证2 天前

    memsstar

    Orbis 3000

    verified-listing-icon
    已验证
    类别
    Wafer Handling
    上次验证： 2 天前
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/172a2ee8e60e4d75bdf49f1de8555305_f97e0e8d674b45d4b9a545fa9da1433b_mw.png
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/1755581d21ef48309483e5ca0a49f763_83a57e9dc875488c9834d696bcfe52ce45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/4325a707e2ff48f39bdc3e67ef2d1476_19ba016b2a8a4e779652e64eb60d31ae45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/16fd27f29481444caab378212b5f19e0_f3c76a2c7ec943fca050c85d4a012bea45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/776675a42d0d45a6b3e1b4383cfddf6a_20096804f89c4c7d9b060fe4e4cf41ed45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/16a69cac0c504518a056ce1af805e92b_5ae2e145d05a4b91835ee0467710baf845005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/2055378e96be4b208cb257987e5dc058_0b156a9c6a84483185b21e590e7bd04a45005c_mw.jpeg
    listing-photo-ceb9a30d83584688ab34c330a48686b6-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/86978/ceb9a30d83584688ab34c330a48686b6/4f00992e9b8f4945ad03f322eaa7a81d_198842cd24b4407a9c64ec9133dd557145005c_mw.jpeg
    物品主要详细信息
    状况：

    New

    运行状况:

    未知

    产品编号：

    147939

    晶圆尺寸：

    未知

    年份：

    2021

    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Purpose: Vapor MEMS Release -Use for silicon sacrificial layer removal (Etching) -Single wafer process in vacuum chamber -Process Temperature can be 5oC to >100oC
    配置
    Chemicals: HF Process type: Single wafer Pumping system: -Ebara AA200WN*2 -Ebara AA40WN*2 (1 for service and 1 for spare) Local Scrubber: Kanken Techno KW300
    OEM 型号描述
    未提供
    文件

    无文件

    类似上架物品
    查看全部
    memsstar Orbis 3000

    memsstar

    Orbis 3000

    Wafer Handling年份： 2021状况： 全新上次验证：2 天前