说明
Post CMP Scrubber配置
Dual brush and top side brush chambers, spin dry Gas - 1:100 DHF COMPONENT : MAINFRAME, CHEMICAL CABINET MX-7500 TBC BRUSH LOAD CELL AMP PRE-TECH FINEJET GENERATOR 0.750KVA TRANSFOMER FA-21000A PC HFC-VWE HITACHI INVERTER HF CIRCULATION FILTEROEM 型号描述
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.文件
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SCREEN / DNS / DAINIPPON SCREEN
AS-2000
已验证
类别
Wet Benches - Auto
上次验证： 8 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
119525
晶圆尺寸：
8"/200mm
年份：
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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SCREEN / DNS / DAINIPPON SCREEN
AS-2000
类别
Wet Benches - Auto
上次验证： 8 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
119525
晶圆尺寸：
8"/200mm
年份：
1999
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Post CMP Scrubber配置
Dual brush and top side brush chambers, spin dry Gas - 1:100 DHF COMPONENT : MAINFRAME, CHEMICAL CABINET MX-7500 TBC BRUSH LOAD CELL AMP PRE-TECH FINEJET GENERATOR 0.750KVA TRANSFOMER FA-21000A PC HFC-VWE HITACHI INVERTER HF CIRCULATION FILTEROEM 型号描述
The new post-CMP cleaner improves throughput by 50% by reducing wafer transfer and drying time. Footprint is also reduced by optimally arranging each processing unit. Moreover, inline configuration with chemical mechanical polisher is also possible.文件
无文件