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NAURA / AKRION / NORTH MICROELETRONICS 3120G
    说明
    Single-wafer wet cleaning system
    配置
    Process: Single-spin process 3-layer, 12-chamber structure with individual process module controllers Throughput: 420 wafers/hour with 100-second process Supported chemicals: APM / DSP / DHF / IPA / H-IPA Nano-spray cleaning IPA drying Load ports: (4) FOUP in/out ports N₂ purge Wafer handling: 4-arm index transfer robot 4-arm process transfer robot Wafer recovery function for abnormal process conditions Antistatic chuck pins and support pins CO₂-DIW electrostatic discharge control Process performance: Particle performance: ≤20 particles at 45 nm on silicon wafer IPA Rotagoni dryer particle performance: ≤30 particles at 19 nm Front-side uniformity: ≤2% Back-side uniformity: ≤3% Applications: DSP / APM / DHF / IPA cleaning processes DIFF / DEPO pre-clean Oxide etch clean ETCH / CMP post-clean Metal-layer etch clean Airflow and exhaust: Downflow FFU exhaust system Particle removal and suppression in wafer transfer and process zones Automatic exhaust-pressure damper control Construction: Chemical-contact components: PTFE and PFA Non-chemical-contact components: PVC Wafer transfer zone: Antistatic PVC Chemical management: Chemical circulation filter installed in CDS Inlet filter: Optional Chemical mixing-ratio monitoring Monitoring and data: FDC data Daily wafer production count Alarm history viewing and analysis CCTV recording of each chamber and wafer transfer module for wafer-breakage analysis Safety: Pressure resistance Corrosion resistance Heat resistance Interlocks External light-and-sound signal tower
    OEM 型号描述
    The NAURA 3120G is a high-end, 12-inch front-end single-wafer cleaning equipment manufactured by NAURA Technology Group. It is primarily utilized in the semiconductor manufacturing sector for integrated circuit (IC) front-end cleaning processes.
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    verified-listing-icon

    已验证

    类别
    Wet Processing / Wafer Cleaning

    上次验证: 6 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    152936


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    NAURA / AKRION / NORTH MICROELETRONICS 3120G

    NAURA / AKRION / NORTH MICROELETRONICS

    3120G

    Wet Processing / Wafer Cleaning
    年份: 0状况: 二手
    上次验证6 天前

    NAURA / AKRION / NORTH MICROELETRONICS

    3120G

    verified-listing-icon
    已验证
    类别
    Wet Processing / Wafer Cleaning
    上次验证: 6 天前
    listing-photo-1ada95b60433415bb08cd041c11ca5ca-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/87760/1ada95b60433415bb08cd041c11ca5ca/cd4cc804ef2c453ca56156f990d06673_untitled1_mw.png
    listing-photo-1ada95b60433415bb08cd041c11ca5ca-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/87760/1ada95b60433415bb08cd041c11ca5ca/561ebf3f89eb45098c26cb0e4ae96415_untitled3_mw.png
    listing-photo-1ada95b60433415bb08cd041c11ca5ca-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/87760/1ada95b60433415bb08cd041c11ca5ca/765fdcd95ec24a27af282151ef567acb_untitled2_mw.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    152936


    晶圆尺寸:

    未知


    年份:

    未知


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Single-wafer wet cleaning system
    配置
    Process: Single-spin process 3-layer, 12-chamber structure with individual process module controllers Throughput: 420 wafers/hour with 100-second process Supported chemicals: APM / DSP / DHF / IPA / H-IPA Nano-spray cleaning IPA drying Load ports: (4) FOUP in/out ports N₂ purge Wafer handling: 4-arm index transfer robot 4-arm process transfer robot Wafer recovery function for abnormal process conditions Antistatic chuck pins and support pins CO₂-DIW electrostatic discharge control Process performance: Particle performance: ≤20 particles at 45 nm on silicon wafer IPA Rotagoni dryer particle performance: ≤30 particles at 19 nm Front-side uniformity: ≤2% Back-side uniformity: ≤3% Applications: DSP / APM / DHF / IPA cleaning processes DIFF / DEPO pre-clean Oxide etch clean ETCH / CMP post-clean Metal-layer etch clean Airflow and exhaust: Downflow FFU exhaust system Particle removal and suppression in wafer transfer and process zones Automatic exhaust-pressure damper control Construction: Chemical-contact components: PTFE and PFA Non-chemical-contact components: PVC Wafer transfer zone: Antistatic PVC Chemical management: Chemical circulation filter installed in CDS Inlet filter: Optional Chemical mixing-ratio monitoring Monitoring and data: FDC data Daily wafer production count Alarm history viewing and analysis CCTV recording of each chamber and wafer transfer module for wafer-breakage analysis Safety: Pressure resistance Corrosion resistance Heat resistance Interlocks External light-and-sound signal tower
    OEM 型号描述
    The NAURA 3120G is a high-end, 12-inch front-end single-wafer cleaning equipment manufactured by NAURA Technology Group. It is primarily utilized in the semiconductor manufacturing sector for integrated circuit (IC) front-end cleaning processes.
    文件

    无文件

    类似上架物品
    查看全部
    NAURA / AKRION / NORTH MICROELETRONICS 3120G

    NAURA / AKRION / NORTH MICROELETRONICS

    3120G

    Wet Processing / Wafer Cleaning年份: 0状况: 二手上次验证:6 天前