说明
无说明配置
无配置OEM 型号描述
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.文件
无文件
LAM RESEARCH / NOVELLUS / GASONICS
L3510
已验证
类别
Ashers / Plasma Cleaner
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
102753
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS / GASONICS
L3510
类别
Ashers / Plasma Cleaner
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
102753
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
PEP3510A is a dry chemistry downstream processing system for photoresist removal, manufactured by GaSonics. It incorporates the company’s proprietary microwave downstream processing technology and is designed for advanced IC manufacturers. The system can handle feature sizes of 0.25 microns and below, with throughput rates ranging from approximately 45 to 55 wafers per hour.文件
无文件