说明
无说明配置
无配置OEM 型号描述
The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes. Having the following features, it can provide a CD measurement environment suitable for fabricating next-generation semiconductor devices: (1) Excellent observation performance based on the electron optical design common in the S-9000 Series, (2) Enhanced CD measurement reproducibility, throughput, and other basic performance capabilities, (3) Improved process-variation monitoring, (4) Instrument performance maintenance/control support functions, and (5) New process application functions such as those for beam-tilt observations, surface charged-specimen measurements, and ArF-resist measurements.文件
无文件
HITACHI
S-9260
已验证
类别
CD-SEM
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
109926
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
HITACHI
S-9260
类别
CD-SEM
上次验证： 60 多天前
物品主要详细信息
状况：
Refurbished
运行状况:
未知
产品编号：
109926
晶圆尺寸：
未知
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
无配置OEM 型号描述
The Hitachi Model S-9260 CD-SEM system has been developed to meet the requirements of these new fabrication processes. Having the following features, it can provide a CD measurement environment suitable for fabricating next-generation semiconductor devices: (1) Excellent observation performance based on the electron optical design common in the S-9000 Series, (2) Enhanced CD measurement reproducibility, throughput, and other basic performance capabilities, (3) Improved process-variation monitoring, (4) Instrument performance maintenance/control support functions, and (5) New process application functions such as those for beam-tilt observations, surface charged-specimen measurements, and ArF-resist measurements.文件
无文件