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EVGroup (EVG) EVG101
  • EVGroup (EVG) EVG101
  • EVGroup (EVG) EVG101
  • EVGroup (EVG) EVG101
说明
coater Atmospheric pressure epoxy coating machine
配置
AP-EPOXY_COAT-01
OEM 型号描述
EVG 101 Advanced Resist Processing System The EVG101 resist processing system performs R&D-type processes on a single chamber design, which is fully compatible with EVG’s automated systems. The EVG101 supports wafers up to 300 mm and can be configured for spin or spray coating and developing. Conformal layers of photoresist or polymers are achieved on 3D structured wafers for interconnection techniques with EVG’s advanced OmniSpray coating technology. This ensures low material consumption of precious high-viscosity photoresists or polymers while improving uniformity and resist spreading options.
文件

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类别
Coaters & Developers

上次验证: 60 多天前

物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

115784


晶圆尺寸:

6"/150mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

EVGroup (EVG)

EVG101

verified-listing-icon
已验证
类别
Coaters & Developers
上次验证: 60 多天前
listing-photo-3ebb4071485549e59af6fbaaf880b16c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
物品主要详细信息

状况:

Used


运行状况:

未知


产品编号:

115784


晶圆尺寸:

6"/150mm


年份:

未知


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
coater Atmospheric pressure epoxy coating machine
配置
AP-EPOXY_COAT-01
OEM 型号描述
EVG 101 Advanced Resist Processing System The EVG101 resist processing system performs R&D-type processes on a single chamber design, which is fully compatible with EVG’s automated systems. The EVG101 supports wafers up to 300 mm and can be configured for spin or spray coating and developing. Conformal layers of photoresist or polymers are achieved on 3D structured wafers for interconnection techniques with EVG’s advanced OmniSpray coating technology. This ensures low material consumption of precious high-viscosity photoresists or polymers while improving uniformity and resist spreading options.
文件

无文件