说明
Multi Block (Resist Coater/Developer)配置
Tokyo Electron Ltd. (TEL) CLEAN TRACK LITHIUS Pro Z-iOEM 型号描述
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.文件
无文件
类别
Coaters & Developers
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
122922
晶圆尺寸：
12"/300mm
年份：
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
LITHIUS Pro Z
类别
Coaters & Developers
上次验证： 30 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
122922
晶圆尺寸：
12"/300mm
年份：
2021
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
Multi Block (Resist Coater/Developer)配置
Tokyo Electron Ltd. (TEL) CLEAN TRACK LITHIUS Pro Z-iOEM 型号描述
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.文件
无文件