说明
无说明配置
Track Configuration Coat cups- 2 Developer cups- 3 ADH (TAD)- 2 Resist reduction- RRC Developer nozzle- SH Oven Configuration PEB- CLHP x4 COT- CLHP x3 / HCP x2 DEV- HCP x1 Stepper- HCP x2 Post bake- LHP x4 Resist & Chemicals Resist pump- RDS 4 ml, 10 ml Resist supply- Gallon bottle Thinner- OK73OEM 型号描述
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.文件
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类别
Coaters & Developers
上次验证： 2 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150243
晶圆尺寸：
12"/300mm
年份：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
LITHIUS Pro Z
类别
Coaters & Developers
上次验证： 2 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
150243
晶圆尺寸：
12"/300mm
年份：
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Track Configuration Coat cups- 2 Developer cups- 3 ADH (TAD)- 2 Resist reduction- RRC Developer nozzle- SH Oven Configuration PEB- CLHP x4 COT- CLHP x3 / HCP x2 DEV- HCP x1 Stepper- HCP x2 Post bake- LHP x4 Resist & Chemicals Resist pump- RDS 4 ml, 10 ml Resist supply- Gallon bottle Thinner- OK73OEM 型号描述
The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.文件
无文件