说明
WCVD (Chemical Vapor Deposition)配置
无配置OEM 型号描述
The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.文件
无文件
LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS MAX
已验证
类别
CVD
上次验证： 16 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
91735
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / NOVELLUS
CONCEPT THREE "C3" ALTUS MAX
类别
CVD
上次验证： 16 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
91735
晶圆尺寸：
12"/300mm
年份：
未知
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
WCVD (Chemical Vapor Deposition)配置
无配置OEM 型号描述
The ALTUS Max is a tungsten deposition system that provides advanced contact and via fill technology. It is designed to deliver high productivity and is the first ALD tungsten system to achieve a throughput of over 120 wafers per hour. This sets a new benchmark in productivity while maintaining world-class reliability and single-digit 65 nm defect performance. The ALTUS Max is a powerful tool for semiconductor manufacturing.文件
无文件