说明
System dimensions (cm): 80x85 x188 Weight : 330 Kg配置
-Capable of 4"-8" wafers. -Non-patterned surface Inspection System. -0.12 micron Defect Sensitivity @ 95% capture, based on PSL Standards. -0.02 ppm Haze Sensitivity. -Waves Length 488 nm, 30mw ArLaser, Blue Laser , Spot Size 90µ; -Scan Frequency 170 Hz; Scan Pitch: 10,20 and 40µ; -Throughput 120/6" wph -Single puck handling from single cassette or platform -Win 98 software, CD ROM Writer software version: 4. 2 -XY coordinates, GEM SECS: options availableOEM 型号描述
The Surfscan 6420 detects submicron defects on metal films and rough surfaces but still provides sensitivity down to 0.1 micron on polished silicon. It is effective for detecting defects on non-uniform films, a critical requirement for CMP applications.文件
无文件
KLA
SURFSCAN 6420
已验证
类别
Defect Inspection
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
113497
晶圆尺寸：
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
年份：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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KLA
SURFSCAN 6420
类别
Defect Inspection
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
113497
晶圆尺寸：
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
年份：
1996
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
System dimensions (cm): 80x85 x188 Weight : 330 Kg配置
-Capable of 4"-8" wafers. -Non-patterned surface Inspection System. -0.12 micron Defect Sensitivity @ 95% capture, based on PSL Standards. -0.02 ppm Haze Sensitivity. -Waves Length 488 nm, 30mw ArLaser, Blue Laser , Spot Size 90µ; -Scan Frequency 170 Hz; Scan Pitch: 10,20 and 40µ; -Throughput 120/6" wph -Single puck handling from single cassette or platform -Win 98 software, CD ROM Writer software version: 4. 2 -XY coordinates, GEM SECS: options availableOEM 型号描述
The Surfscan 6420 detects submicron defects on metal films and rough surfaces but still provides sensitivity down to 0.1 micron on polished silicon. It is effective for detecting defects on non-uniform films, a critical requirement for CMP applications.文件
无文件