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SEMILAB FAAST 230
    说明
    无说明
    配置
    . Automatic robotic wafer handling . Single open-cassette wafer loading station Non-contact CV/IV Measurement System . Measurement of dielectric and interface properties on monitor wafer - Dielectric Capacitance (CD) and Thickness (EOT) - Dielectric Leakage Current (I-V) - Flatband Voltage (Vfb) - Interface Trap Density (Dit) - Interface Trapped Charge (Qit) - Semiconductor Surface Barrier (Vsb) - Oxide Total Charge (Qtot) - Mobile Ionic Charge (Qm), among others . Suitable for measurement on: - Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)
    OEM 型号描述
    The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.
    文件

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    类别
    Defect Inspection

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    102007


    晶圆尺寸:

    8"/200mm


    年份:

    2000


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available

    SEMILAB

    FAAST 230

    verified-listing-icon
    已验证
    类别
    Defect Inspection
    上次验证: 60 多天前
    listing-photo-e145eb42e4a24d35869c323426c6ad82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e145eb42e4a24d35869c323426c6ad82/08b9d75073d148cdae1644785c8eb1ca_screenshot20240422at7_mw.png
    listing-photo-e145eb42e4a24d35869c323426c6ad82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e145eb42e4a24d35869c323426c6ad82/a2957680f76b44f7b7f3ad7eaf391773_screenshot20240422at7_mw.png
    listing-photo-e145eb42e4a24d35869c323426c6ad82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e145eb42e4a24d35869c323426c6ad82/3f99063b14474ae8919ae596e45ca224_screenshot20240718at11_mw.png
    listing-photo-e145eb42e4a24d35869c323426c6ad82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e145eb42e4a24d35869c323426c6ad82/db7cf3bc49914fa4a3a7386a463955a8_screenshot20240718at11_mw.png
    listing-photo-e145eb42e4a24d35869c323426c6ad82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/1987/e145eb42e4a24d35869c323426c6ad82/7dcc447aa4e9489bb295f67cf8a6585f_screenshot20240718at11_mw.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    102007


    晶圆尺寸:

    8"/200mm


    年份:

    2000


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    无说明
    配置
    . Automatic robotic wafer handling . Single open-cassette wafer loading station Non-contact CV/IV Measurement System . Measurement of dielectric and interface properties on monitor wafer - Dielectric Capacitance (CD) and Thickness (EOT) - Dielectric Leakage Current (I-V) - Flatband Voltage (Vfb) - Interface Trap Density (Dit) - Interface Trapped Charge (Qit) - Semiconductor Surface Barrier (Vsb) - Oxide Total Charge (Qtot) - Mobile Ionic Charge (Qm), among others . Suitable for measurement on: - Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)
    OEM 型号描述
    The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.
    文件

    无文件