说明
无说明配置
. Automatic robotic wafer handling . Single open-cassette wafer loading station Non-contact CV/IV Measurement System . Measurement of dielectric and interface properties on monitor wafer - Dielectric Capacitance (CD) and Thickness (EOT) - Dielectric Leakage Current (I-V) - Flatband Voltage (Vfb) - Interface Trap Density (Dit) - Interface Trapped Charge (Qit) - Semiconductor Surface Barrier (Vsb) - Oxide Total Charge (Qtot) - Mobile Ionic Charge (Qm), among others . Suitable for measurement on: - Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)OEM 型号描述
The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.文件
无文件
SEMILAB
FAAST 230
已验证
类别
Defect Inspection
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
102007
晶圆尺寸：
8"/200mm
年份：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SEMILAB
FAAST 230
类别
Defect Inspection
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
102007
晶圆尺寸：
8"/200mm
年份：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
. Automatic robotic wafer handling . Single open-cassette wafer loading station Non-contact CV/IV Measurement System . Measurement of dielectric and interface properties on monitor wafer - Dielectric Capacitance (CD) and Thickness (EOT) - Dielectric Leakage Current (I-V) - Flatband Voltage (Vfb) - Interface Trap Density (Dit) - Interface Trapped Charge (Qit) - Semiconductor Surface Barrier (Vsb) - Oxide Total Charge (Qtot) - Mobile Ionic Charge (Qm), among others . Suitable for measurement on: - Semiconductor wafers (e.g. Si, SiGe, InGaAs, SiC, GaN) with high-k and low-k dielectric films (e.g. SiO2, SiNx, Al2O3, HfO2 ;..)OEM 型号描述
The SEMILAB FAAST 230 is a non-contact, fast in-line monitoring system designed to detect heavy metal contamination, including sub 108 atoms/cm-3 Fe detection, in a medium to high-volume manufacturing environment. It features automated wafer handling, with options for SMIF/FOUP Loadport/Versaport, and can perform full wafer FAST mapping of diffusion length, Iron, and other recombination centers. The system is configurable for 100 mm to 300 mm wafers and is compatible with other Semilab SDI FAaST tool measurement technologies. Additional options include a minienvironment, wafer edge-grip handling, wafer flipper for automatic backsurface measurement, and more.文件
无文件