说明
WxZ(STD)配置
3C/HOEM 型号描述
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文件
无文件
类别
Deposition
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
112358
晶圆尺寸：
8"/200mm
年份：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA MCVD
类别
Deposition
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
112358
晶圆尺寸：
8"/200mm
年份：
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
WxZ(STD)配置
3C/HOEM 型号描述
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文件
无文件