说明
CVD配置
4C/HOEM 型号描述
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文件
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APPLIED MATERIALS (AMAT)
CENTURA MCVD
已验证
类别
Deposition
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
112356
晶圆尺寸:
未知
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
查看全部APPLIED MATERIALS (AMAT)
CENTURA MCVD
类别
Deposition
上次验证: 60 多天前
物品主要详细信息
状况:
Used
运行状况:
未知
产品编号:
112356
晶圆尺寸:
未知
年份:
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
CVD配置
4C/HOEM 型号描述
The AMAT Centura MCVD is a highly versatile Reactors/MOCVD (Metal-Organic Chemical Vapor Deposition) system designed for use with 8" wafer sizes. Its unique architecture features four processing stations and two auxiliary chambers arranged around a central transfer module housing a reliable magnetically-coupled vacuum robot. This configuration enables efficient and precise wafer handling, facilitating the epitaxial growth of compound semiconductor materials. The Centura MCVD system is well-suited for various applications in the semiconductor industry, providing advanced capabilities for high-quality thin-film deposition and meeting the demands of modern manufacturing processes.文件
无文件