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APPLIED MATERIALS (AMAT) CENTURA TxZ
    说明
    HEATER
    配置
    无配置
    OEM 型号描述
    The Centura TxZ is a chemical vapor deposition (CVD) system that is used for depositing thin films of various materials on semiconductor wafers. It can be used with 8” wafer size and CVD system size is also 8”. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum.
    文件

    无文件

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

    verified-listing-icon

    已验证

    类别
    Deposition

    上次验证: 60 多天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    106360


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
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    APPLIED MATERIALS (AMAT) CENTURA TxZ

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

    Deposition
    年份: 0状况: 二手
    上次验证60 多天前

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

    verified-listing-icon
    已验证
    类别
    Deposition
    上次验证: 60 多天前
    listing-photo-3fa554a4b2644d0691dd43c18978e9df-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    106360


    晶圆尺寸:

    未知


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    HEATER
    配置
    无配置
    OEM 型号描述
    The Centura TxZ is a chemical vapor deposition (CVD) system that is used for depositing thin films of various materials on semiconductor wafers. It can be used with 8” wafer size and CVD system size is also 8”. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum. In September 1996, the Liner TxZ Centura system was launched. This system combines a new CVD TiN chamber with a Coherent PVD Ti chamber, and allows for deposition of sequential layers of Ti and CVD TiN in high-aspect-ratio metal structures under vacuum.
    文件

    无文件

    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) CENTURA TxZ

    APPLIED MATERIALS (AMAT)

    CENTURA TxZ

    Deposition年份: 0状况: 二手上次验证:60 多天前