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APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT
    说明
    Metal CVD (Chemical Vapor Deposition)
    配置
    无配置
    OEM 型号描述
    Employing a unique, “selective” suppression mechanism, the Centura® iSprint™ ALD/CVD SSW process delivers the industry’s first bottom-up CVD W gap fill, free of voids and seams. It optimizes the volume of W, creating more robust features and helping to improve yield.
    文件

    无文件

    APPLIED MATERIALS (AMAT)

    CENTURA AP ISPRINT

    verified-listing-icon

    已验证

    类别
    Deposition

    上次验证: 14 天前

    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    113702


    晶圆尺寸:

    12"/300mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT

    APPLIED MATERIALS (AMAT)

    CENTURA AP ISPRINT

    Deposition
    年份: 0状况: 二手
    上次验证14 天前

    APPLIED MATERIALS (AMAT)

    CENTURA AP ISPRINT

    verified-listing-icon
    已验证
    类别
    Deposition
    上次验证: 14 天前
    listing-photo-30f7125359594e51a55e68c1ce270a06-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    物品主要详细信息

    状况:

    Used


    运行状况:

    未知


    产品编号:

    113702


    晶圆尺寸:

    12"/300mm


    年份:

    未知


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    说明
    Metal CVD (Chemical Vapor Deposition)
    配置
    无配置
    OEM 型号描述
    Employing a unique, “selective” suppression mechanism, the Centura® iSprint™ ALD/CVD SSW process delivers the industry’s first bottom-up CVD W gap fill, free of voids and seams. It optimizes the volume of W, creating more robust features and helping to improve yield.
    文件

    无文件

    类似上架物品
    查看全部
    APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT

    APPLIED MATERIALS (AMAT)

    CENTURA AP ISPRINT

    Deposition年份: 0状况: 二手上次验证:14 天前
    APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT

    APPLIED MATERIALS (AMAT)

    CENTURA AP ISPRINT

    Deposition年份: 0状况: 二手上次验证:14 天前
    APPLIED MATERIALS (AMAT) CENTURA AP ISPRINT

    APPLIED MATERIALS (AMAT)

    CENTURA AP ISPRINT

    Deposition年份: 2006状况: 二手上次验证:60 多天前