说明
Complete system配置
CVD System, 12” <45nm process 2 Chambers: CVD & ALD Process: NiOx, HfOx Trias cluster: 2 Loadports LM: Front end Main power distribution (MPD) Transfer module, TM EX reactor, PM2: Plasma capability: No Includes: Ozonizer & H20 Box 2 Touch screens ozonizer High-k CVD reactor PM4: Thermal based deposition Transformer box (Hi-K) option elec box: Manuals & Spareparts included Machine is in absolute as good as new condition ex R&D facility PM2: Hafnium Nickel Titaan Vanadium PM4: Hafnium Nickel Titaan Ruthenium StrontiumOEM 型号描述
Trias High-k CVD system is a 300mm single-wafer cluster tool designed to produce thin-film materials required for the advanced gate stack, which will be incorporated in the most advanced semiconductor devices at the 45nm node and beyond.文件
TEL / TOKYO ELECTRON
TRIAS HIGH-k
已验证
类别
Deposition
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
39978
晶圆尺寸：
12"/300mm
年份：
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
TRIAS HIGH-k
类别
Deposition
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
39978
晶圆尺寸：
12"/300mm
年份：
2010
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available