说明
CVD system配置
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM 型号描述
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.文件
无文件
类别
Deposition
上次验证： 5 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
154819
晶圆尺寸：
12"/300mm
年份：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
TRIASe+ Ti/TiN
类别
Deposition
上次验证： 5 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
154819
晶圆尺寸：
12"/300mm
年份：
2022
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
CVD system配置
Known issues: Not included: Chamber Gate Valve; MFC7; (Qty 2) LM-Arm End Effector Pads (Rear); (Qty 2) Chamber APC Valve; LM-Robot (Front-End); (Qty 3) Process Kit; (Qty 2) LM-Arm End Effector Pads (Front); Chemgaurd ClF3 Cabinet; (Qty 3) Chamber Trap Trias Mainframe (Qty 3) EXII Chamber FOUP Factory Interface Yaskawa Dual Arm Handler Process: TiN Software Version: V5 750R1 CIM: SECS/GEMOEM 型号描述
Triase+™ Ti/TiN is a 300mm single-wafer metal CVD system for high step coverage Ti/TiN film formation using TiCl4.文件
无文件