说明
无说明配置
Components: 1 x Orienter 1 x MxP Poly 2 x MxP+ Poly 1 x eMxP+ Software Version: 4.9_15 ESC Type: Polymide Endpoint: Monochromator Gases Used: NF3 CH3F CL2 HBr CHF3 Ar CF4 O2 N2 C4F8 CO Mass Flow Controllers (MFCs): 32 Digital MFCs (14-Unit or 18-Horiba) Robot: HP Robot Dry Pumps: 4 x IQDP80 2 x IQDP80/WSU151 Chillers: 5 x Neslab 150 unitsOEM 型号描述
The AMAT / APPLIED MATERIALS Centura 5200 is an Etchers & Ashers system. The centura 5200 can be used with 8” wafer size and oxidation etchers size is also 8”. The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.文件
无文件
类别
Dry / Plasma Etch
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
147163
晶圆尺寸：
未知
年份：
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA 5200
类别
Dry / Plasma Etch
上次验证： 今天
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
147163
晶圆尺寸：
未知
年份：
1998
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
无说明配置
Components: 1 x Orienter 1 x MxP Poly 2 x MxP+ Poly 1 x eMxP+ Software Version: 4.9_15 ESC Type: Polymide Endpoint: Monochromator Gases Used: NF3 CH3F CL2 HBr CHF3 Ar CF4 O2 N2 C4F8 CO Mass Flow Controllers (MFCs): 32 Digital MFCs (14-Unit or 18-Horiba) Robot: HP Robot Dry Pumps: 4 x IQDP80 2 x IQDP80/WSU151 Chillers: 5 x Neslab 150 unitsOEM 型号描述
The AMAT / APPLIED MATERIALS Centura 5200 is an Etchers & Ashers system. The centura 5200 can be used with 8” wafer size and oxidation etchers size is also 8”. The Centura architecture clusters four processing stations and two auxiliary chambers around a central transfer module containing an ultra-reliable magnetically-coupled vacuum robot.文件
无文件