说明
2 chamber DPS Metal, 2chamber ASP+, 2 Orienter/degas配置
2 chamber DPS Metal, 2chamber ASP+, 2 Orienter/degasOEM 型号描述
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).文件
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APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
已验证
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105384
晶圆尺寸：
8"/200mm
年份：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
105384
晶圆尺寸：
8"/200mm
年份：
2000
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
2 chamber DPS Metal, 2chamber ASP+, 2 Orienter/degas配置
2 chamber DPS Metal, 2chamber ASP+, 2 Orienter/degasOEM 型号描述
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).文件
无文件