说明
power 1 pump 4配置
Gas: CDA/P-N2/N2/P-O2/CF4/He/SF6/HBrOEM 型号描述
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).文件
无文件
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
130514
晶圆尺寸：
6"/150mm
年份：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
类似上架物品
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APPLIED MATERIALS (AMAT)
CENTURA METAL DPS
类别
Dry / Plasma Etch
上次验证： 60 多天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
130514
晶圆尺寸：
6"/150mm
年份：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
power 1 pump 4配置
Gas: CDA/P-N2/N2/P-O2/CF4/He/SF6/HBrOEM 型号描述
Two new etch systems were launched in 1996 for HDP etching of metal and silicon films, using AMAT's DPS (Decoupled Plasma Source) technology. The DPS Metal Etch Centura and DPS Silicon Etch Centura are aimed at very advanced applications, primarily for deep submicron devices (0.25-micron).文件
无文件