说明
WxZ(WPLUG)配置
无配置OEM 型号描述
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.文件
无文件
类别
Dry / Plasma Etch
上次验证： 29 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
127723
晶圆尺寸：
8"/200mm
年份：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA
类别
Dry / Plasma Etch
上次验证： 29 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
127723
晶圆尺寸：
8"/200mm
年份：
1999
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
WxZ(WPLUG)配置
无配置OEM 型号描述
The Centura is Applied’s most versatile platform. Launched in 1992, over 8,000 Centura systems have been shipped to customers around the world. For ≤200mm fabrication the applications supported include CVD, epitaxy, etch, plasma nitridation and RTP. In September 1992, AMAT announced its latest generation single-wafer, multichamber platform, the Centura, to target the high temperature thin films market as well as future process applications with 0.5 micron and below specifications.文件
无文件