说明
EGA03 Chamber配置
无配置OEM 型号描述
For etching advanced conducting films, Applied launched DPS systems in fiscal 2001, the Metal Etch DPS™ II and Silicon Etch DPS™ II Centura systems, offering customers the technology, productivity and reliability required for 100nm and below processing.文件
无文件
APPLIED MATERIALS (AMAT)
CENTURA METAL DPS II
已验证
类别
Dry / Plasma Etch
上次验证： 12 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
117434
晶圆尺寸：
未知
年份：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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APPLIED MATERIALS (AMAT)
CENTURA METAL DPS II
类别
Dry / Plasma Etch
上次验证： 12 天前
物品主要详细信息
状况：
Used
运行状况:
未知
产品编号：
117434
晶圆尺寸：
未知
年份：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
说明
EGA03 Chamber配置
无配置OEM 型号描述
For etching advanced conducting films, Applied launched DPS systems in fiscal 2001, the Metal Etch DPS™ II and Silicon Etch DPS™ II Centura systems, offering customers the technology, productivity and reliability required for 100nm and below processing.文件
无文件